GALACTIC GAVA 500 CAPVD PVD sputtering machine was built in 2022 in
Poland. This extremely technically advanced system is designed to
coat, among others, cutting tools, moulds and punches with
super-durable coatings with high resistance to abrasion and chemical
agents. The CAPVD (Cathodic Arc Physical Vapour Deposition) method
used, compared to standard PVD methods, allows highly dense and
adherent coatings to be produced with good deposition rates and
thicknesses (± 5 nm).
In the process, atoms from a source (cathode) placed in the working
chamber are vaporised using an electric arc. These atoms then transfer
and deposit onto the surface of the workpieces, creating a thin
coating. The GAVA 500 PVD sputtering machine is equipped with all the
necessary components of the best technical specifications and meets
the highest industry standards.
Technical specifications of the GALACTIC GAVA 500 CAPVD PVD sputtering
machine
- PLC controller: MITSUBISHI A1S1
- coating types: TiN, TiCN,TiAlN, TiAlNEX, CrN, ZrN, CrAlN, TiSiAlN,
AlCrN, ZrO, CrCO
- vacuum chamber dimensions (dia. x h): ⌀600 x 600 mm
- maximum workpiece weight: 500 kg
- maximum vacuum: 5x 6-10 M51251405 mbar
- CAPVD evaporator (2 pcs.)
- Roots pump: LEYBOLD 501 S (2 pcs.)
- Roots pump capacity: 4040 m3/h
- Roots pump pressure: 3-10 mbar
- turbomolecular pump: LEYBOLD MAGiNTEGRA
- turbomolecular pump capacity: 2000 l/s
- turbomolecular pump pressure: 6-10 mbar
- compressor
- cooling device (chiller)
- satellite grips (18 pcs.)
- process gas distribution: mass flowmeters with sensors
- temperature control: K-type thermocouple
- power supply of the GALACTIC GAVA 500 CAPVD machine: 3x 400 V; 50 Hz
Poland
