photoresist processing system SUSS MICROTEC Gamma

Manufacturer: SUSS

Model: MicroTec Gamma

Year of Manufacture: 2010

CE Marked: Yes

Electrical Specifications:

- Voltage: 400V, 3-phase +N+PE
- Power: 22 kVA, 50 Hz
- AIC: 100 kA / 400V
- FLC: 32 A

Pneumatic Requirements:

- CDA (Clean Dry Air): 5 bar
- Nitrogen (N₂): 5 bar
- Vacuum (VAC): -0.8 bar
- Deionized Water (DIW): 5 bar

System Overview:

High-performance automated coater/developer system designed for semiconductor and MEMS processing. Ideal for 4" to 8" wafers.

- Wafer Size: 4-fold I/O for 4"–8" wafers
- Software: Version 4.41c(23)
- Operating System: Windows XP Professional, Version 2002, Service Pack 3
- Processor: 2.0 GHz
- Memory: 500 MB RAM

Configuration :

- 4-fold U5558834 I/O with Sankio U5558834 double gripper
- 2 Developer Modules (1 medium size)
- 1 Coating Module (2 lacquers, IDI)
- 7 Hot Plates (HP)
- 2 Chill Plates (CP)
- 1 Flood Exposure Unit
- Mechanical Centering
- Media Cabinet
- Control Cabinet
- 4x Julabo Temperature Controllers

Find more here - /

Contact us at -
seller offer No. resale 7364892